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1 bipolar ion implantation
іонна імплантація для біполярних приладівEnglish-Ukrainian dictionary of microelectronics > bipolar ion implantation
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2 implantation
1) іонна імплантація, іонне легування (див. т-ж implant) 2) рідк. іонно-імплантована область - angled ion implantation
- arsenic ion implantation
- bipolar ion implantation
- blanket ion implantation
- deep ion implantation
- double-ion implantation
- emitter ion implantation
- field-oxide implantation
- field implantation
- high-dosage ion implantation
- high-energy ion implantation
- high-level ion implantation
- hot implantation
- ion-beamimplantation
- ionimplantation
- low-dosage ion implantation
- low-energy ion implantation
- low-level ion implantation
- masked ion implantation
- maskless implantation
- molecular ion implantation
- multiple implantation
- multiple energy ion implantation
- multiple energy implantation
- n-type ion implantation
- oblique-rotating implantation
- post emitter ion implantation
- predep implantation
- p-type ion implantation
- self-aligned ion implantation
- single-ion implantation
- surface-wide ion implantation
- surface-wide implantation
- tilt-angle implantationEnglish-Ukrainian dictionary of microelectronics > implantation
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3 processing
1) (технологічна) обробка; проведення процесу 2) технологія (див. т-ж process, technique, technology) 3) обробка (інформації) - array processing
- batch-modeprocessing
- batchprocessing
- beam processing
- bipolar processing
- chip processing
- CMOS/SOS processing
- component pre-insertion processing
- component processing
- computer word processing
- digital image processing
- dry processing
- electroless processing
- electron-beam processing
- epitaxial processing
- excimer laser processing
- exposive-shock processing
- fabrication processing
- hands-off processing
- high-resolution processing
- high-temperature processing
- high-volume processing
- high-yield processing
- image processing
- in-line processing
- ion-beam processing
- ion-implantation processing
- isothermal processing
- laser cold processing
- liquid chemical processing
- liquid processing
- lithographic processing
- maskless processing
- microelectronic processing
- microgravity processing
- MOS processing
- multimask processing
- multi-User MEMS processing MUMPS
- multi-User MEMS processing
- multiple-chemical processing
- on-line data processing
- pel-to-pel processing
- photochemical processing
- photoresist processing
- pipeline processing
- planar processing
- planar plasma processing
- plasma processing
- post ion-implantation processing
- pyrolytic laser processing
- radiation-free processing
- relief-mask processing
- single-wafer semiconductor processing
- single-wafer processing
- slice-at-a-time processing
- space semiconductor processing
- submicrometer processing
- submicron processing ї
- TAB processing
- temperature-gradient zone-melting processing
- thermal processing
- unattended processing
- vacuum infrared processing
- vertical processing
- wafer-by-wafer processing
- wet chemical processing
- wet processingEnglish-Ukrainian dictionary of microelectronics > processing
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4 process
1. ім.1) процес; (технологічний) метод, спосіб2) технологія (див. т-ж technique, technology)3) (технологічна) обробка; технологічна операція2. дієсл. обробляти; проводити технологічну операцію - all-ion-implant process
- all-planar process
- Auger process
- batch process
- BH bias and hardness process
- BH process
- bonding process
- BOX process
- bulk CMOS process
- bumping process
- chip-on-board process
- closed CMOS process
- CMOS-on-sapphire process
- composite сеll logic process
- contact process
- conventional process
- deep охide isolation process
- DIFET process
- diffused eutectic aluminum process
- direct synthesis and crystal pull process
- double-diffused process
- double ion-implanted process
- double-layer polysilicon gate MOS process
- double-layer polysilicon gate process
- epitaxial deposition process
- epitaxial process
- epitaxial growth process
- flip-over process
- floating-gate silicon process
- front-end process
- gold-doped process
- guard-banded CMOS process
- heterogeneous process
- high-voltage process
- HMOS process
- imaging process
- implantation process
- in-house process
- interconnection process
- inverted meniscus process
- ion plating process
- isoplanar -S, -Z, -2 process
- isoplanar process
- junction-isolated process
- laser-recrystallized process
- lithographic process
- low-pressure process
- low VT process
- lost wafer process
- major process
- masking process
- master slice process
- mesa-isolation process
- metal-gate MOS process
- metal-gate process
- microbipolar LSI process
- micrometer-dimension process
- mid-film process
- Minimod process
- Mo-gate MOS process
- Mo-gate process
- nitride process
- nitrideless process
- NSA process
- oxide-film isolation process
- oxide isolated process
- oxygen refilling process
- patterning process
- phosphorous buried-emitter process
- photoablative process
- photolithography process
- photoresist process
- planar oxidation process
- Planox process
- plasma etch process
- Poly I process
- Poly II process
- Poly 5 process
- poly-oxide process
- Poly-Si process
- polysilicon-gate process
- poly-squared MOS process
- proprietary process
- PSA bipolar process
- PSA process
- refractory metal MOS process
- refractory metal process
- sacrificial охide process
- sapphire dielectric isolation process
- scaled Poly 5 process
- screen-and-fire process
- selective field-охidation process
- self-aligned gate process
- self-aligned process
- self-registered gate process
- self-registered process
- semi-additive process
- semiconductor-thermoplastic-dielectric process
- semicustom process
- shadow masking process
- silk-screen process
- single poly process
- SMOS process
- SOS/CMOS process
- stacked fuse bipolar process
- Stalicide process
- step-and-repeat process
- subtractive-fabrication process
- surface process
- Telemos process
- thermal process
- thermally асtivated surface process
- thermal-охidation process
- three-mask process
- triple-diffused process
- triply-poly process
- twin-tub process
- twin-well process
- V-groove MOS process
- V-groove process
- wet process
- 3-D process
См. также в других словарях:
bipolar ion implantation — dvipolių darinių implantavimas statusas T sritis radioelektronika atitikmenys: angl. bipolar ion implantation vok. Ionenimplantation in bipolaren Geräten, f rus. ионная имплантация для биполярных приборов, f pranc. implantation ionique pour… … Radioelektronikos terminų žodynas
implantation ionique pour bipolaires — dvipolių darinių implantavimas statusas T sritis radioelektronika atitikmenys: angl. bipolar ion implantation vok. Ionenimplantation in bipolaren Geräten, f rus. ионная имплантация для биполярных приборов, f pranc. implantation ionique pour… … Radioelektronikos terminų žodynas
Ionenimplantation in bipolaren Geräten — dvipolių darinių implantavimas statusas T sritis radioelektronika atitikmenys: angl. bipolar ion implantation vok. Ionenimplantation in bipolaren Geräten, f rus. ионная имплантация для биполярных приборов, f pranc. implantation ionique pour… … Radioelektronikos terminų žodynas
dvipolių darinių implantavimas — statusas T sritis radioelektronika atitikmenys: angl. bipolar ion implantation vok. Ionenimplantation in bipolaren Geräten, f rus. ионная имплантация для биполярных приборов, f pranc. implantation ionique pour bipolaires, f … Radioelektronikos terminų žodynas
ионная имплантация для биполярных приборов — dvipolių darinių implantavimas statusas T sritis radioelektronika atitikmenys: angl. bipolar ion implantation vok. Ionenimplantation in bipolaren Geräten, f rus. ионная имплантация для биполярных приборов, f pranc. implantation ionique pour… … Radioelektronikos terminų žodynas
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